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US 2015/0176149 A1Published application
Process for preparing an epitaxial alpha-quartz layer on a solid support, material obtained and uses thereof
AssigneesCentre National De La Recherche Scientifique, Consejo Superior De Investigaciones Cientificas (Csic)
InventorsCedric Boissiere, Adrien Carretero-Genevrier, Marti Gich, David Grosso, Clement Sanchez
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Abstract
The present invention relates to a process for preparing epitaxial α-quartz layers on a solid substrate, to the material obtained according to this process, and to the various uses thereof, especially in the electronics field.
Claims27
Process for preparing an epitaxial α-quartz layer on a solid support, comprising the following steps:
- i) a step of preparing a composition containing, in a solvent, at least one silica and/or colloidal silica precursor;
- ii) a step of depositing a layer of the composition obtained above in step i) onto at least part of the surface of a substrate and the formation of an amorphous silica matrix layer;
- iii) a step of heat treatment of the amorphous silica matrix layer obtained in step ii) to obtain an epitaxial α-quartz layer,
- wherein:
- the substrate is a self-supporting substrate chosen from mono-oriented crystalline silicon, germanium dioxide, corundum, magnesium oxide, strontium titanate, lithium niobiate, lithium tantalate, cerium oxide, gadolinium cerium mixed oxides Ce(1-x)CidxO2 in which x is such that 0<x<1, lanthanum aluminate, gallium nitride, yttrium-doped zirconium dioxide and gallium orthophosphate, and in that
- the step of heat treatment of the amorphous silica layer is performed at a temperature of greater than or equal to 800° C., in the presence of at least one catalyst based on one of the following elements in oxidation state (+2):
- strontium, barium, calcium, magnesium, beryllium, or one of the following elements in oxidation state (+1):
- caesium, rubidium, lithium, sodium or potassium, or capable of generating one of the following elements in oxidation state (+2):
- strontium, barium, calcium, magnesium, beryllium, or one of the following elements in oxidation state (+1):
- caesium, rubidium, sodium, potassium or lithium, said catalyst being present in said amorphous silica matrix.
7 more elements
Process according to any one of the preceding claims, wherein the process is a sol-gel process in which:
- the composition used in step i) is a sol-gel composition containing, in a solvent, at least one silica precursor,
- the formation of the amorphous silica matrix layer on the surface of the substrate is performed by evaporating the solvent contained in the sot-gel composition,
- the substrate is a mono-oriented crystalline silicon substrate,
- the step of heat treatment of the silica layer is performed in the presence of oxygen and at atmospheric pressure, and
- the catalyst is a catalyst based on strontium, barium or calcium in oxidation state (+2) or which is capable of generating strontium, barium or calcium in oxidation state (+2).
2 more elements
Dependencies are inferred from the claim text.