Film formation apparatus and film formation method

A film formation method comprising:

• a film formation step of heating a film formation source which includes therein a film forming material to release vapors of the film forming material and forming a film of the film forming material on a film formation object while monitoring an amount of the released vapors of the film forming material using a quartz oscillator for measurement;
• a control step of adjusting a heating temperature of the film formation source based on the monitored value of the quartz oscillator for measurement;
• and
• a calibration step of monitoring, using a quartz oscillator for calibration, the amount of the released vapors of the film forming material and calibrating, using the monitored value, the monitored value of the quartz oscillator for measurement,
• wherein the calibration step is performed in a middle of the film forming step of forming the film on the film formation object.

A film formation method comprising:

• a film formation step of moving a film thickness sensor for monitoring and a film thickness sensor for calibration together while maintaining a relative position of the film thickness sensor for monitoring, the film thickness sensor for calibration, and an evaporation source to thereby form a film;
• and
• a calibration step of calibrating a thickness of the film obtained by use of the film thickness sensor for monitoring by using a calibration value calculated based on a thickness of the film obtained by use of the film thickness sensor for calibration,
• wherein the calibration step is performed concurrently with the film formation step.