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US 2015/0176128 A1Published application
Substrate Processing Apparatus
AssigneeEugene Technology Co., Ltd.
InventorsByoung-Gyu Song, Kyong-Hun Kim, Yong-Ki Kim, Yang-Sik Shin, Chang-Dol Kim, Chang-Hun Shin, Eun-Duck Kim
Life of this patent
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Abstract
There is provided a substrate processing apparatus including: a chamber providing an internal space, in which a substrate is transferred through a passage and a process is performed on the substrate, and having a supply port supplying a gas to the substrate; and a susceptor installed in the internal space and including a heating region heating the substrate and a pre-heating region pre-heating the gas supplied from the supply port.
Claims10
A substrate processing apparatus, comprising:
- a chamber providing an internal space, in which a substrate is transferred through a passage and a process is performed on the substrate, and having a supply port supplying a gas to the substrate;
- and
- a susceptor installed in the internal space and including a heating region heating the substrate and a pre-heating region pre-heating the gas supplied from the supply port.
Dependencies are inferred from the claim text.