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US 2015/0175945 A1Published application
Cleaning formulation and method
AssigneeXeros Limited
InventorsAlan John Waddon, Robert Andrew Bird, Stephen Derek Jenkins
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AssigneeXeros Limited
InventorsAlan John Waddon, Robert Andrew Bird, Stephen Derek Jenkins
Estimating the term…
The invention provides a formulation and method for the treatment of a substrate, the method comprising the treatment of the substrate with the formulation, the formulation comprising a multiplicity of solid cleaning particles and a multiplicity of dosing particles, wherein the dosing particles comprise at least one host material and at least one releasable material, wherein the host material comprises at least one partially or completely water soluble polymeric material and the at least one releasable material comprises at least one cleaning or post-cleaning agent or other treatment additive for the treatment of the substrate. The method and formulation are advantageously applied to the cleaning of textile fabrics.
1-63. (canceled)
A formulation comprising a multiplicity of solid cleaning particles and a multiplicity of dosing particles, wherein said dosing particles comprise at least one host material and at least one releasable material, wherein said host material comprises at least one partially or completely water soluble polymeric material and said at least one releasable material comprises at least one cleaning and/or post-cleaning agent and/or other treatment additive for the treatment of the substrate.
A method for the cleaning of a cleaning apparatus, said method comprising the treatment of the internal systems of the apparatus with a formulation comprising a multiplicity of solid cleaning particles and a multiplicity of dosing particles, wherein said dosing particles comprise at least one host material and at least one releasable material, wherein said host material comprises at least one partially or completely water soluble polymeric material and said at least one releasable material comprises an antimicrobial agent.
A method for the removal of dosing particles or residues thereof from a cleaning apparatus during or after the treatment of a substrate, said method comprising the solubilisation of said dosing particles, optionally wherein the temperature or pH of the system is adjusted so as to solubilise the insoluble material of the dosing particles.
Dependencies are inferred from the claim text.