# US 2015/0147701 A1 · Composition for forming topcoat layer and resist pattern formation method employing the same > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2015/0147701 A1 - Document ID: US20150147701A1 - Status: Published application - Kind: A1 - Application number: 14/549,911 - Filed: 2014-11-21 - Published: 2015-05-28 - Earliest claimed: 2013-11-22 - Assignees: Samsung Electronics Co., Ltd.; AZ Electronics Materials (Luxembourg) S.A.R.L. - Inventors: Hyun-woo KIM; Cheol hong PARK; Tetsuo OKAYASU; Xiaowei WANG; Georg PAWLOWSKI; Yusuke HAMA - Web page: https://patentgrep.com/patent/US20150147701A1 ## CPC - C09D 7/62: modified by treatment with other compounds - C09D 5/00: Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced {(electrically insulating plastics, resins or waxes H01B3/30)}; Filling pastes - C09D 7/40: Additives - G03F 7/091: {characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement} - G03F 7/11: having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} - G03F 7/2004: {characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light} - C08K 3/042: {Graphene or derivatives, e.g. graphene oxides} - C09D: COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics A61K; processes for applying liquids or other fluent materials to surfaces, in general, B05D; staining wood B27K5/02; glazes or vitreous enamels C03C; natural resins, French polish, drying-oils, driers, turpentine, per se, C09F; polishing compositions other than French polish, ski waxes C09G; adhesives or use of materials as adhesives C09J; materials for sealing or packing joints or covers C09K3/10; materials for stopping leaks C09K3/12; processes for the electrolytic or electrophoretic production of coatings C25D) - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - C08K: Use of inorganic or non-macromolecular organic substances as compounding ingredients (paints, inks, varnishes, dyes, polishes, adhesives C09) ## Abstract Provided is a composition for forming a topcoat layer, the composition including a graphene derivative including a hydrophilic group; and a solvent. Also provided is a pattern formation method, including disposing a resist composition on a substrate, to form a resist layer; coating the resist layer with a composition including a graphene derivative including a hydrophilic group, and a solvent; heating the composition to harden the composition; subjecting the resist layer to exposure using extreme ultraviolet light; and developing exposed resist layer with an alkali aqueous solution. ## Claims ### Claim 1 A composition for forming a topcoat layer, the composition comprising: a graphene derivative including a hydrophilic group; and a solvent. ### Claim 2 (depends on 1) The composition as claimed in claim 1, wherein the hydrophilic group is selected from a hydroxyl group, a carboxyl group, an amino group, an amido group, a nitro group, a cyano group, a polyalkyleneoxide group, and a sulfo group. ### Claim 3 (depends on 1) The composition as claimed in claim 1, wherein the graphene derivative is obtained by oxidizing graphene. ### Claim 4 (depends on 1) The composition as claimed in claim 1, wherein the graphene derivative is present in an amount of about 0.01 to about 10 wt % based on a total weight of the composition. ### Claim 5 (depends on 1) The composition as claimed in claim 1, further comprising a binder. ### Claim 6 (depends on 5) The composition as claimed in claim 5, wherein the binder includes a deep-ultraviolet absorbing group. ### Claim 7 (depends on 5) The composition as claimed in claim 5, wherein the binder is present in an amount about 0.01 to about 10 wt % based on a total weight of the composition. ### Claim 8 (depends on 1) The composition as claimed in claim 1, wherein an oxygen content of the graphene derivative is equal to or greater than about 1 wt % and equal to or less than about 30 wt % based on a total weight of the graphene derivative. ### Claim 9 (depends on 1) The composition as claimed in claim 1, wherein a weight average molecular weight of the graphene derivative is about 1000 to about 20000. ### Claim 10 (depends on 1) The composition as claimed in claim 1, further comprising a nonionic surfactant. ### Claim 11 (depends on 10) The composition as claimed in claim 10, wherein an amount of the nonionic surfactant is about 0.01 to about 1 wt % based on a total weight of the composition. ### Claim 12 (depends on 1) A pattern formation method, comprising: disposing a resist composition on a substrate, to form a resist layer; coating the resist layer with the composition as claimed in claim 1; heating the composition to harden the composition; subjecting the resist layer to exposure using extreme ultraviolet light; and developing exposed resist layer with an alkali aqueous solution. ### Claim 13 (depends on 12) The pattern formation method as claimed in claim 12, wherein the extreme ultraviolet light has a wavelength in a range of about 5 to about 20 nm. ### Claim 14 (depends on 13) The pattern formation method as claimed in claim 13, wherein the composition has a thickness of about 1 to about 100 nm on the resist layer. ### Claim 15 (depends on 12) The pattern formation method as claimed in claim 12, wherein the heating step is carried out at a temperature of about 25 to about 150° C. ### Claim at position 16 16-20. (canceled)