# US 2015/0144153 A1 · Ultraviolet light based cleansing method and cleansing device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2015/0144153 A1 - Document ID: US20150144153A1 - Status: Published application - Kind: A1 - Application number: 14/118,231 - Filed: 2013-08-29 - Published: 2015-05-28 - Earliest claimed: 2013-08-23 - Assignees: Shenzhen China Star Optoelectronics Technology Co., Ltd. - Applicants: Shenzhen China Star Optoelectronics Technology Co., Ltd. - Inventors: Jiangbo Yao; Chunliang Lee - Web page: https://patentgrep.com/patent/US20150144153A1 ## CPC - B08B 7/0057: {by ultraviolet radiation} - B08B 3/022: {Cleaning travelling work (B08B3/042 takes precedence)} - B08B 3/041: {Cleaning travelling work} - B08B 3/08: the liquid having chemical or dissolving effect - B08B 7/04: by a combination of operations - B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL ## Abstract The present invention provides an ultraviolet light based cleansing method and cleansing device. The method includes: (1) irradiating a substrate to be cleansed with ultraviolet light and controlling output energy of the ultraviolet light in order to control photon energy received by TFT component patterns formed on the substrate to be cleansed within an irradiation time period to be less than electron excitation energy that breaks down TFT component patterns; (2) cleansing the substrate to be cleansed with an alkaline solution; (3) cleansing the substrate to be cleansed with water/gas dual-fluid; (4) cleansing the substrate to be cleansed with deionized water; (5) drying the substrate to be cleansed with an air knife; and (6) subjecting the substrate to be cleansed to dehydration and drying to complete the cleansing operation, thereby improving product yield rate and cleanness. ## Claims ### Claim 1 An ultraviolet light based cleansing method, comprising the following steps: (1) irradiating a substrate to be cleansed with ultraviolet light and controlling output energy of the ultraviolet light in order to control photon energy received by TFT component patterns formed on the substrate to be cleansed within an irradiation time period to be less than electron excitation energy that breaks down TFT component patterns; (2) cleansing the substrate to be cleansed with an alkaline solution; (3) cleansing the substrate to be cleansed with water/gas dual-fluid; (4) cleansing the substrate to be cleansed with deionized water; (5) drying the substrate to be cleansed with an air knife; and (6) subjecting the substrate to be cleansed to dehydration and drying to complete the cleansing operation. ### Claim 2 (depends on 1) The ultraviolet light based cleansing method as claimed in claim 1, wherein the ultraviolet light has a wavelength of 172 nm and the ultraviolet light has an output energy less than or equal to 130 mj/cm2. ### Claim 3 (depends on 1) The ultraviolet light based cleansing method as claimed in claim 1, wherein the alkaline solution is tetramethylammonium hydroxide solution. ### Claim 4 (depends on 3) The ultraviolet light based cleansing method as claimed in claim 3, wherein mass concentration of tetramethylammonium hydroxide of the tetramethylammonium hydroxide solution is 0.4%-2.38%. ### Claim 5 An ultraviolet light based cleansing method, comprising the following steps: (1) irradiating a substrate to be cleansed with ultraviolet light and controlling output energy of the ultraviolet light in order to control photon energy received by TFT component patterns formed on the substrate to be cleansed within an irradiation time period to be less than electron excitation energy that breaks down TFT component patterns; (2) cleansing the substrate to be cleansed with an alkaline solution; (3) cleansing the substrate to be cleansed with water/gas dual-fluid; (4) cleansing the substrate to be cleansed with deionized water; (5) drying the substrate to be cleansed with an air knife; and (6) subjecting the substrate to be cleansed to dehydration and drying to complete the cleansing operation; wherein the ultraviolet light has a wavelength of 172 nm and the ultraviolet light has an output energy less than or equal to 130 mj/cm2. ### Claim 6 (depends on 5) The ultraviolet light based cleansing method as claimed in claim 5, wherein the alkaline solution is tetramethylammonium hydroxide solution. ### Claim 7 (depends on 6) The ultraviolet light based cleansing method as claimed in claim 6, wherein mass concentration of tetramethylammonium hydroxide of the tetramethylammonium hydroxide solution is 0.4%-2.38%. ### Claim 8 An ultraviolet light based cleansing device, comprising: a conveyance device, which functions to carry and convey a substrate to be cleansed; an ultraviolet light emission device, which is located above the conveyance device to emit ultraviolet light having a wavelength of 172 nm to the substrate to be cleansed, wherein the ultraviolet light having the wavelength of 172 nm has an output energy less than or equal to 130 mj/cm2; a first spraying device, which is located above the conveyance device and is located at one side of the ultraviolet light emission device to spray an alkaline solution to the substrate to be cleansed; a sprinkling device, which is located above the conveyance device and is located at one side of the first spraying device that is distant from the ultraviolet light emission device to sprinkle water/gas dual-fluid to the substrate to be cleansed; a second spraying device, which is located above the conveyance device and located at one side of the sprinkling device that is distant from the first spraying device to spray deionized water to the substrate to be cleansed; an air-blowing device, which is located above the conveyance device and located at one side of the second spraying device that is distant from the sprinkling device to blow air to the substrate to be cleansed; and a drying device, which is located above the conveyance device and located at one side of the air-blowing device that is distant from the second spraying device to heat and dry the substrate to be cleansed. ### Claim 9 (depends on 8) The ultraviolet light based cleansing device as claimed in claim 8, wherein the ultraviolet light emission device comprises an ultraviolet lamp. ### Claim 10 (depends on 8) The ultraviolet light based cleansing device as claimed in claim 8, wherein the alkaline solution is tetramethylammonium hydroxide solution. ### Claim 11 (depends on 10) The ultraviolet light based cleansing device as claimed in claim 10, wherein mass concentration of tetramethylammonium hydroxide of the tetramethylammonium hydroxide solution is 0.4%-2.38%. ### Claim 12 (depends on 8) The ultraviolet light based cleansing device as claimed in claim 8, wherein the air-blowing device comprises an air knife. ### Claim 13 (depends on 8) The ultraviolet light based cleansing device as claimed in claim 8, wherein the drying device comprises a heat plate.