Systems and methods for high and ultra-high vacuum physical vapor deposition with in-situ magnetic field
AssigneeThe Trustees of Columbia University in HIe City of
InventorsKENNETH L. SHEPARD, William E. Bailey, Noah Andrew Sturcken, Cheng Cheng, Sioan Zohar
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Abstract
Systems and methods for high and ultra-high vacuum physical vapor deposition with in-situ magnetic field are disclosed herein. An exemplary method for depositing a film in an evacuated vacuum chamber can include introducing a sample into the vacuum chamber. The sample can be rotated. A magnetic field can be applied that rotates synchronously with the rotating sample. Atoms can be deposited onto the sample while the sample is rotating with the magnetic field to deposit a film while the magnetic field induces magnetic anisotropy in the film.
Claims20
A method for depositing a film in an evacuated vacuum chamber, comprising:
- introducing a sample into the vacuum chamber;
- rotating the sample;
- applying a magnetic field that rotates synchronously with the rotating sample;
- and
- depositing atoms onto the sample while the sample is rotating with the magnetic field to thereby cause a portion of the atoms to be deposited on the sample as the film while the magnetic field induces magnetic anisotropy in the film.
A system for vacuum film deposition, comprising:
- a vacuum chamber;
- a physical vapor deposition device disposed in the vacuum chamber;
- a sample holder disposed in the vacuum chamber;
- a motor configured to rotate the sample holder;
- and
- a magnetic field source adapted to rotate a magnetic field synchronously with the sample holder.
Dependencies are inferred from the claim text.