MANUFACTURING METHOD FOR Si02-Ti02 BASED GLASS, MANUFACTURING METHOD FOR PLATE-SHAPED MEMBER MADE OF Si02-Ti02 BASED GLASS, MANUFACTURING DEVICE, AND MANUFACTURING DEVICE FOR Si02-Ti02 BASED GLASS
AssigneeNikon Corporation
InventorsToshio YOSHINARI, Tadahiko Saito
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Abstract
A method for manufacturing an SiO2—TiO2 based glass upon a target by a direct method, includes a first process of preheating the target and a second process of growing an SiO2—TiO2 based glass ingot to a predetermined length upon the target which has been preheated, wherein the target is heated in the first process such that, in the second process, the temperature of growing surface of the glass ingot is maintained at or above a predetermined lower limit temperature.
Claims13
A method for manufacturing an SiO2—TiO2 based glass upon a target by a direct method, comprising:
- a first process of preheating the target;
- and
- a second process of growing an SiO2—TiO2 based glass ingot to a predetermined length upon the target which has been preheated, wherein
- the target is heated in the first process such that, in the second process, the temperature of growing surface of the glass ingot is maintained at or above a predetermined lower limit temperature.
A manufacturing device for SiO2—TiO2 based glass by growing a glass ingot upon a target by a direct method, comprising:
- the target comprises a thermal storage portion that accumulates heat by being preheated, and a heat insulating portion that suppresses conduction of heat from the thermal storage portion in the direction opposite to the glass ingot.
Dependencies are inferred from the claim text.