System and Process for Calibrating Pyrometers in Thermal Processing Chambers
AssigneeMattson Technology, Inc.
InventorPaul Janis Timans
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Abstract
A method and system for calibrating temperature measurement devices, such as pyrometers, in thermal processing chambers are disclosed. According to the present invention, the system includes a calibrating light source that emits light energy onto a substrate contained in the thermal processing chamber. A light detector then detects the amount of light that is being transmitted through the substrate. The amount of detected light energy is then used to calibrate a temperature measurement device that is used in the system.
Claims12
1-71. (canceled)
A process for determining a temperature dependent optical characteristic of a wafer, comprising:
- placing a wafer made of semiconductor material within a thermal processing chamber, the thermal processing chamber comprising a heating source and at least one coherent light source;
- emitting light energy from the at least one coherent light source;
- altering the coherence of the light energy emitted from the at least one coherent light source to generate light energy of altered coherence;
- detecting, with at least one light detector, the amount of light energy of altered coherence that is transmitted through or reflected from the wafer;
- and
- determining a temperature dependent optical characteristic of the wafer based on the detected light energy.
Dependencies are inferred from the claim text.