Lithographic apparatus

A lithographic apparatus comprising:

• a patterning device support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the patterning device support comprising a moveable structure movably arranged with respect to an object, a patterning device holder movably arranged with respect to the movable structure and configured to hold the patterning device, an actuator configured to move the movable structure with respect to the object, and an ultra short stroke actuator configured to move the patterning device holder with respect to the movable structure;
• a substrate support constructed to hold a substrate;
• and
• a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
• a position measurement system configured to measure a substrate positional error which is a difference between a desired position of the substrate relative to a reference object and an actual position of the substrate relative to the reference object;
• and
• a controller configured to move the ultra short stroke actuator exclusively on the basis of:
• the substrate positional error and optionally a measured position of the patterning device holder relative to the moveable structure.

A lithographic apparatus comprising:

• a patterning device support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the patterning device system comprising a moveable structure movably arranged with respect to an object, a patterning device holder movably arranged with respect to the movable structure and configured to hold the patterning device, an actuator configured to move the movable structure with respect to the object, and an ultra short stroke actuator configured to move the patterning device holder with respect to the movable structure;
• a substrate support constructed to hold a substrate;
• and
• a projection system configured to project the patterned radiation beam onto a target portion of the substrate,
• a position measurement system configured to measure a position of the patterning device holder and/or patterning device relative to the movable structure;
• and
• a controller configured to move the ultra short stroke actuator on the basis of a positional error signal and the position of the patterning device holder and/or patterning device measured by the position measurement system.

A lithographic apparatus comprising:

• a patterning device support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the patterning device system comprising a moveable structure movably arranged with respect to an object, an patterning device holder movably arranged with respect to the movable structure and configured to hold the patterning device, an actuator configured to move the movable structure with respect to the object, and an ultra short stroke actuator configured to move the patterning device holder with respect to the movable structure;
• a substrate support constructed to hold a substrate;
• a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
• and
• an open loop controller configured to move the ultra short stroke actuator on the basis of a positional error signal.

A lithographic apparatus comprising:

• a patterning device support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the patterning device system comprising a moveable structure movably arranged with respect to an object, a patterning device holder movably arranged with respect to the movable structure and configured to hold the patterning device, an actuator configured to move the movable structure with respect to the object, and an ultra short stroke actuator configured to move the patterning device holder with respect to the movable structure;
• a substrate support constructed to hold a substrate;
• a projection system configured to project the patterned radiation beam onto a target portion of the substrate,
• a transmission image sensor for measuring a position of the patterned radiation beam downstream of the projection system;
• and
• a calibrator for determining a relationship between magnitude of an applied control signal to the ultra short stroke actuator and resulting change in position of the patterned radiation beam and/or patterning device holder and/or patterning device.

A lithographic apparatus comprising:

• a patterning device support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;
• a substrate support constructed to hold a substrate;
• and
• a projection system configured to project the patterned radiation beam onto a target portion of the substrate,
• wherein the patterning device supports comprises:
• a moveable structure movably arranged with respect to an object,
• a patterning device holder movably arranged with respect to the movable structure and configured to hold the patterning device;
• an actuator configured to move the movable structure with respect to the object;
• and
• an ultra short stroke actuator configured to move the patterning device holder with respect to the movable structure and comprising a plurality of actuators positioned around at least part of a circumference of the patterning device holder.