Exposure apparatus, exposure method, and device manufacturing method

A device manufacturing method comprising:

• exposing a substrate using an exposure apparatus;
• and
• developing the exposed substrate,
• wherein the exposure apparatus that exposes an image of a pattern formed on an original onto a substrate as a first pattern forming area through a first projection optical system having a first projection magnification and comprises:
• an original holding unit configured to hold the original;
• a substrate holding unit configured to hold the substrate;
• and
• a controller configured to control scanning of the original holding unit and the substrate holding unit so as to expose the first pattern forming area onto a second pattern forming area exposed in advance on the substrate via a second projection optical system having a second projection magnification differing from the first projection magnification with the first pattern forming area superimposed on the second pattern forming areas,
• wherein the original has the pattern in plural, and the controller is configured to change the operation of the original holding unit or the substrate holding unit among the plurality of second pattern forming areas based on the state of the second pattern forming areas or the state of the patterns formed on the original while the first pattern forming areas are scanning-exposed onto the plurality of second pattern forming areas in a single scanning between the original holding unit and the substrate holding unit.