Substrate holder, lithographic apparatus, and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsSiegfried Alexander Tromp, Nicolaas Ten Kate, Raymond Wilhelmus Louis Lafarre
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Abstract
A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body, a plurality of burls and a heater and/or a temperature sensor. The main body has a surface. The plurality of burls project from the surface and have end surfaces to support a substrate. The heater and/or temperature sensor is provided on the main body surface. The substrate holder is configured such that when a substrate is supported on the end surfaces, a thermal conductance between the heater and/or temperature sensor and the substrate is greater than a thermal conductance between the heater and/or temperature sensor and the main body surface.
Claims18
A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
- a main body having a surface;
- a plurality of burls projecting from the surface and having end surfaces to support a substrate;
- and
- a heater and/or a temperature sensor, on the main body surface,
- wherein when a substrate is supported on the end surfaces, a thermal conductance between the heater and/or temperature sensor and the substrate is greater than a thermal conductance between the heater and/or temperature sensor and the main body surface.
A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
- a main body having a surface;
- a plurality of burls projecting from the surface and having end surfaces to support a substrate;
- and
- a heater and/or a temperature sensor, on the main body surface,
- wherein when a substrate is supported on the end surfaces, a distance between the heater and/or temperature sensor and the main body surface is greater than a distance between the heater and/or temperature sensor and the substrate.
Dependencies are inferred from the claim text.