Display device and method for fabricating the same

A method for fabricating a display device, the method comprising:

• forming a gate insulating film, which has a hole for exposing at least a part of a first metal pattern, on a gate electrode formed on a first region of a substrate and the first metal pattern formed on a second region of the substrate;
• forming source and drain electrodes on the gate insulating film of the first region, and forming a second metal pattern on the insulating film of the second region;
• forming a first material layer for forming a pixel electrode, on an entire surface of the substrate including the source electrode, the drain electrode, and the second metal pattern;
• forming the pixel electrode electrically connected with the drain electrode on the first region by patterning the first material layer and forming a first protection electrode, which is electrically connected with the second metal pattern and covers the second metal pattern, on the second metal pattern in the second region;
• forming a passivation film on an entire surface of the substrate including the pixel electrode and the first protection electrode, the passivation film being provided with a second hole for exposing at least a part of the first metal pattern and a third hole for exposing at least a part of the first protection electrode;
• and
• forming a common electrode on the passivation film in the first region and forming a connection electrode on the passivation film in the second region, the connection electrode being connected with the first metal pattern through a first contact hole formed by a combination of the first hole and the second hole and being connected with the first protection electrode through a second contact hole formed of the third hole.