Hybrid phase field effect transistor
AssigneeIntel Corporation
InventorsRavi Pillarisetty, Brian S. Doyle, Elijah V. Karpov, David L. Kencke, Uday Shah, Charles C. Kuo, Robert S. Chau
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AssigneeIntel Corporation
InventorsRavi Pillarisetty, Brian S. Doyle, Elijah V. Karpov, David L. Kencke, Uday Shah, Charles C. Kuo, Robert S. Chau
Estimating the term…
An insulating layer is deposited over a transistor structure. The transistor structure comprises a gate electrode over a device layer on a substrate. The transistor structure comprises a first contact region and a second contact region on the device layer at opposite sides of the gate electrode. A trench is formed in the first insulating layer over the first contact region. A metal-insulator phase transition material layer with a S-shaped IV characteristic is deposited in the trench or in the via of the metallization layer above on the source side.
A method to manufacture an electronic device, comprising:
An electronic device, comprising:
A method to manufacture an electronic device, comprising:
Dependencies are inferred from the claim text.