Substrate processing device and substrate processing method

A substrate processing apparatus comprising:

• a substrate holding unit that holds a substrate in a horizontal posture;
• a plate that has a size equal to or larger than a principal face of the substrate held by the substrate holding unit, and has a horizontal and flat liquid holding face opposing the principal face of the substrate from below the principal face;
• a processing liquid supply unit that supplies a processing liquid to the liquid holding face;
• a movement unit that relatively moves the substrate holding unit and the plate to bring or separate the principal face of the substrate and the liquid holding face close to or from each other;
• and
• a control unit that controls the processing liquid supply unit and the movement unit to execute a processing liquid film forming step of supplying the processing liquid to the liquid holding face by the processing liquid supply unit to form a processing liquid film on the liquid holding face, a contact step of bringing the principal face of the substrate and the liquid holding face close to each other by the movement unit to bring the principal face of the substrate into contact with the processing liquid film, and a liquid contact maintenance step of maintaining a state where the processing liquid is in contact with the principal face of the substrate after the contact step.