Liquid processing apparatus
AssigneeTokyo Electron Limited
InventorsTerufumi Wakiyama, Norihiro Ito, Jiro Higashijima
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Abstract
A liquid processing apparatus performs a liquid processing on a rotating substrate by supplying a processing liquid. Surrounding members surround a region including an upper space of a cup body surrounding the rotating substrate and provided with an opening above the substrate. An air flow forming portion forms a descending air flow from an upper side of the cup body. A bottom surface portion blocks between the cup body and the surrounding member along a circumferential direction. An exhaust port is provided above the bottom surface portion and outside the cup body to exhaust an atmosphere in a region surrounded by the surrounding members and the bottom surface portion.
Claims17
A liquid processing apparatus in which a liquid processing is performed by supplying a processing liquid, the apparatus comprising:
- a rotatable substrate holding unit configured to hold a substrate;
- a cup body configured to surround the substrate holding unit and provided with an opening above the substrate;
- a surrounding member configured to surround a region including an upper space of the cup body from an outside of the cup body;
- an air flow forming portion configured to form a descending air flow in the cup body from an upper side of the cup body;
- a bottom surface portion provided along a circumferential direction of the cup body and configured to block a space between the cup body and the surrounding member;
- and
- an exhaust port provided above the bottom surface portion and outside the cup body to exhaust an atmosphere in a region surrounded by the surrounding member and the bottom surface portion.
The liquid processing apparatus of claim 9, wherein the surrounding member is provided with a partition wall which is configured to partition a region in which the processing liquid supply mechanism is provided and a space above the cup body, and is provided with a passage port configured to pass the nozzle arm holding the nozzle, and
- the passage port is used as an exhaust port instead of the exhaust port provided at a position facing the rotation driving unit to exhaust the atmosphere in the region surrounded by the surrounding member and the bottom surface portion and to exhaust an atmosphere in a region where the processing liquid supply mechanism is provided from the position facing the rotation driving unit.
Dependencies are inferred from the claim text.