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US 2015/0090294 A1Published application
Methods and systems for improved mask processing
AssigneeApplied Materials, Inc.
InventorsEdward Ng, Jeffrey C. Hudgens, Ayan Majumdar, Sushant S. Koshti
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Abstract
In some embodiments, methods and systems are provided for improved handling of lithography masks including loading a mask via a first load port from a first carrier; inverting the mask using a first contact pad; cleaning the mask; inverting the mask using a second contact pad; and unloading the mask via a second load port into a second carrier. Numerous other aspects are provided.
Claims20
A method of handling a mask comprising:
- loading a mask via a first load port from a first carrier;
- inverting the mask using a first contact pad;
- cleaning the mask;
- inverting the mask using a second contact pad;
- and
- unloading the mask via a second load port into a second carrier.
3 more elements
A method of handling a mask comprising:
- loading a mask via a load port from a first carrier;
- replacing the first carrier with a second carrier at the load port;
- inverting the mask using a first contact pad;
- cleaning the mask;
- inverting the mask using a second contact pad;
- and
- unloading the mask via the load port into the second carrier.
4 more elements
A system for handling masks comprising:
- a processor;
- and
- a memory coupled to the processor and storing program instructions to:
- load a mask via a first load port from a first carrier;
- invert the mask using a first contact pad;
- clean the mask;
- invert the mask using a second contact pad;
- and
- unload the mask via a second load port into a second carrier.
6 more elements
Dependencies are inferred from the claim text.