Loading patent…
AssigneeMaterion Corporation
InventorsPetr Dedek, Matthew J. Noble
Estimating the term…
A method for removing metal and/or precious metal-containing depositions from substrates, wherein said substrate is subjected to treatment with an organo amine protectant component P and an inorganic active component A. Component P may be formed in situ by reaction with component R. Component P is an organic amine and/or organic amine hydrochloride (preferably diisopropylamine hydrochloride), component A is an inorganic compound (preferably inorganic acid or a mixture thereof) and component R is an organic compound that can be split along the C—N bond by the component A into an organic amine (preferably dimethylformamide or N-methyl pyrrolidone). The metals in the form of organo-metallic complexes can be isolated and/or separated by means of different chemical reactions (preferably reduction reactions) and/or biosorption (preferably with seaweed or yeast).
A method for removing metal and/or precious metal-containing depositions from substrates, wherein said substrate is subjected to treatment with an organo amine protectant component “P”/complexing component “C” and an inorganic active component “A”, wherein said component “P”/“C” is selected from the group including mono-, di- and tri-substituted amine hydrochlorides, wherein each substituent is independently an alkyl having 1 to 18 carbon atoms or a cycloalkyl having 3 to 8 carbon atoms, and wherein said component “A” is an inorganic acid or its salt or a mixture thereof.
Dependencies are inferred from the claim text.