Device wafer processing method
AssigneeDisco Corporation
InventorKazuma Sekiya
Life of this patent
Estimating the term…
Loading patent…
AssigneeDisco Corporation
InventorKazuma Sekiya
Estimating the term…
A device wafer includes a device area where a plurality of devices are formed on the front side of the device wafer and a peripheral marginal area surrounding the device area. Each device has an adhesion disliking region disliking adhesion to an adhesive tape. An ultraviolet curable protective tape is attached as the adhesive tape to the front side of the device wafer. Ultraviolet radiation is applied to a first area of the protective tape corresponding to the adhesion disliking region of the device wafer to thereby reduce the adhesive force in the first area. The ultraviolet radiation is not applied to a second area of the protective tape corresponding to the peripheral marginal area of the device wafer to thereby maintain the adhesive force in the second area. The device wafer is held through the protective tape while the back side of the device wafer is ground.
A device wafer processing method of processing a device wafer including a device area where a plurality of devices are formed on a front side of said device wafer and a peripheral marginal area surrounding said device area, each device having an adhesion disliking region disliking the adhesion to an adhesive tape, said device wafer processing method comprising:
Dependencies are inferred from the claim text.