Method for depositing a film and film deposition apparatus
AssigneeTokyo Electron Limited
InventorsKippei Sugita, Hiroyuki Hashimoto, Muneo Harada
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Abstract
A method for depositing a film is provided. In the method, an object to be processed is accommodated in a process chamber, and an insulating film made of a polymer thin film is deposited on a surface of the object to be processed by supplying a first source gas composed of an acid anhydride and a second source gas composed of a diamine into the process chamber that is evacuated. Next, the insulating film is modified so as to have a barrier function by stopping the supply of the second source gas into the process chamber and continuously supplying the first source gas into the process chamber.
Claims8
A method for depositing a film, comprising steps of:
- accommodating an object to be processed in a process chamber;
- depositing an insulating film made of a polymer thin film on a surface of the object to be processed by supplying a first source gas composed of an acid anhydride and a second source gas composed of a diamine into the process chamber that is evacuated;
- and
- modifying the insulating film so as to cause the insulating film to have a barrier function by stopping the supply of the second source gas into the process chamber and continuously supplying the first source gas into the process chamber.
A film deposition apparatus, comprising:
- a process chamber configured to accommodate an object to be processed;
- a holding unit configured to hold the object to be processed in the process chamber;
- an evacuation system configured to evacuate the process chamber;
- a first gas supply unit configured to supply a first source gas composed of an acid anhydride into the process chamber;
- a second gas supply unit configured to supply a second source gas composed of a diamine into the process chamber;
- a heating unit configured to heat the object to be processed;
- an apparatus control unit configured to control the whole film deposition apparatus, the apparatus control unit performing first control of causing the first gas supply unit to supply the first source gas and causing the second gas supply unit to supply the second source gas so as to deposit an insulating film on a surface of the object to be processed, and then the apparatus control unit performing second control of causing the first gas supply unit to continuously supply the first source gas and causing the second gas supply unit to stop supplying the second source gas.
Dependencies are inferred from the claim text.