Method of manufacturing metal grating
AssigneesTsinghua University, Hon Hai Precision Industry Co., Ltd.
InventorsZHEN-DONG ZHU, QUN-QING LI, LI-HUI ZHANG, MO CHEN, SHOU-SHAN FAN
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Abstract
A method for making a metal grating is provided. The method includes providing a substrate, applying a metal layer on a surface of the substrate, forming a number of protrusions spaced from each other on a surface of the metal layer, wherein each of the number of protrusions is made of two resist layer, one of the two resist layers being made of silicone oligomer, etching the surface of the metal layer exposed out of the number of protrusions using a physical etching gas and a reactive etching gas, and dissolving the number of protrusions on the surface of the metal layer.
Claims20
A method of manufacturing a metal grating, the method comprising:
- S10, providing a substrate;
- S20, applying a metal layer on a surface of the substrate;
- S30, forming a patterned mask layer on a surface of the metal layer, wherein the patterned mask layer comprises a plurality protrusions spaced from each other and located on the surface of the metal layer, each of the plurality protrusions comprises a first protrusion and a second protrusion stacked on top of the first protrusion, and the second protrusion is made of a silicone oligomer;
- S40, etching part of the surface of the metal layer exposed out of the patterned mask layer using a physical etching gas and a reactive etching gas;
- and
- S50, dissolving the patterned mask layer on the surface of the metal layer.
A method of manufacturing a metal grating, the method comprising:
- S10, providing a substrate;
- S20, applying a metal layer on a surface of the substrate;
- S30, forming a plurality of protrusions spaced from each other on the surface of the metal layer, wherein each of the plurality of protrusions comprises of two resist layers, and one of the two resist layers is made of silicone oligomer;
- S40, etching a part of the surface of the metal layer exposed out of the patterned mask layer using a physical etching gas and a reactive etching gas;
- and
- S50, dissolving the plurality of protrusions on the surface of the metal layer.
Dependencies are inferred from the claim text.