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US 2015/0086924 A1Published application
Photoresist System and Method
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChen-Hau Wu, Ching-Yu Chang
Life of this patent
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Abstract
A system and method for photoresists is provided. In an embodiment a cross-linking or coupling reagent is included within a photoresist composition. The cross-linking or coupling reagent will react with the polymer resin within the photoresist composition to cross-link or couple the polymers together, resulting in a polymer with a larger molecular weight. This larger molecular weight will cause the dissolution rate of the photoresist to decrease, leading to a better depth of focus for the line.
Claims20
A photoresist comprising:
- a polymer resin within the photoresist;
- a photoactive compound;
- and
- a cross-linking agent, wherein the cross-linking agent has a structure of
- wherein n can be from between 1 to 15, A and B comprise H, OH, halide, an aromatic carbon ring, or a straight or cyclic alkyl, alkoxyl/fluoro, alkyl/fluoroalkoxyl chain having a carbon number of between 1 and 12, and X and Y comprise —NH2, —SH, —OH, isopropyl alcohol, isopropyl amine, or a thiol.
2 more elements
A photoresist comprising:
- a resin;
- a coupling reagent, wherein the coupling reagent has a structure of
- wherein R is a carbon, nitrogen, sulfur, or oxygen atom, and M comprises —Cl;
- —Br;
- —I;
- —NO2;
- —SO3-;
- —H—;
- —CN;
- —NCO, —OCN;
- —CO2-;
- —OH;
- —OR*, —OC(O)CR*;
- —SR, —SO2N(R*)2;
- —SO2R*;
- SOR;
- —OC(O)R*;
- —C(O)OR*;
- —C(O)R*;
- —Si(OR*)3;
- —Si(R*)3;
- or epoxyl groups;
- and
- a photoactive compound.
21 more elements
A photoresist comprising:
- a resin;
- a cross-linking agent, wherein the cross-linking agent has a structure of
- wherein n can be from between 1 to 15, A and B comprise H, OH, halide, an aromatic carbon ring, or a straight or cyclic alkyl, alkoxyl/fluoro, alkyl/fluoroalkoxyl chain having a carbon number of between 1 and 12, and X and Y comprise —NH2, —SH, —OH, isopropyl alcohol, isopropyl amine, or a thiol.
- a coupling reagent, wherein the coupling reagent has a structure of
- wherein R is a carbon, nitrogen, sulfur, or oxygen atom, and M comprises —Cl;
- —Br;
- —I;
- —NO2;
- —SO3-;
- —H—;
- —CN;
- —NCO, —OCN;
- —CO2-;
- —OH;
- —OR*, —OC(O)CR*;
- —SR, —SO2N(R*)2;
- —SO2R*;
- SOR;
- —OC(O)R*;
- —C(O)OR*;
- —C(O)R*;
- —Si(OR*)3;
- —Si(R*)3;
- or epoxyl groups;
- and
- a photoactive compound.
23 more elements
Dependencies are inferred from the claim text.