Substrate processing method

A substrate processing method employing a substrate processing apparatus that is arranged adjacent to an exposure device that subjects a substrate to exposure processing,

• the substrate processing method comprising the steps of:
• forming a photosensitive film made of a photosensitive material on the substrate before said exposure processing;
• subjecting the substrate after said step of forming the photosensitive film and before said exposure processing to thermal processing;
• cleaning an edge of the substrate after said thermal processing and before said exposure processing using a brush such that a contaminant at the edge, on which the photosensitive film is not formed, of the substrate is physically stripped while horizontally holding the substrate by a holder, rotating the substrate held by the holder around an axis perpendicular to the substrate, and supplying pure water to the edge, on which the photosensitive film is not formed, of the substrate being rotated, immediately before said exposure processing by said exposure device;
• and
• transporting the substrate after said step of cleaning the edge to said exposure device, wherein
• the brush does not come into contact with the photosensitive film formed by the step of forming the photosensitive film in said cleaning step.