Substrate processing apparatus and maintenance method thereof

A maintenance method of a substrate processing apparatus, the substrate processing apparatus including:

• a first processing chamber including a main body part, a lid part and a processing space formed in the first processing chamber;
• a second processing chamber including a main body part, a lid part and a processing space formed in the second processing chamber;
• a transfer chamber that is connected to the first processing chamber and the second processing chamber and has therein a transfer unit configured to transfer a substrate accommodated in the first processing chamber or the second processing chamber;
• a frame structure including a pair of column parts and a beam part supported at top portions of the column parts;
• and
• at least one elevating part that is coupled to the beam part to be movable in a horizontal direction and is configured to move the lid part of the first processing chamber or the second processing chamber in a vertical direction, wherein
• a first working space for performing maintenance of the first processing chamber is provided adjacent to the first processing chamber in an arrangement direction of the first processing chamber and the transfer chamber,
• wherein a second working space for performing maintenance of the second processing chamber is provided adjacent to the second processing chamber in an arrangement direction of the second processing chamber and the transfer chamber, and
• wherein the beam part extends across above the first working space, the first processing chamber, the transfer chamber, the second processing chamber, and the second working space, the method comprising:
• lifting the lid part of the first processing chamber by the elevating part upon the maintenance of the first processing chamber;
• and
• moving the lid part to a region above the transfer chamber in case of the maintenance of the inside of the first processing chamber and moving the lid part to an upper position in the first working space in case of the maintenance of the lid part of the first processing chamber.