System and method for decomposition of a single photoresist mask pattern into 3 photoresist mask patterns

A single photoresist mask pattern to a plurality of photoresist mask patterns decomposition system, the system comprising one or more instructions stored on a non-transitory computer-readable medium, comprising:

• a processor for assigning nodes to polygon features on the single photoresist mask pattern, the processor designating nodes as being adjacent nodes for those nodes that are less than a predetermined distance apart, the processor iteratively removing nodes having 2 or less adjacent nodes until no nodes having 2 or less adjacent nodes remain and one or more internal nodes remain, the processor determining a decomposability of the single photoresist mask pattern to the plurality of photoresist mask patterns based on the one or more internal nodes, the processor mapping colors to the one or more internal nodes, the processor replacing and mapping a color to each of the nodes removed by the temporarily removing nodes, such that each node does not have an adjacent node of the same color, the processor providing an indication of the decomposability of the single photoresist mask pattern to the plurality of photoresist mask patterns;
• and
• a memory storing information describing an order of iteratively removing nodes by the processor.