Methods for modifying an integrated circuit layout design

A system for modifying an integrated circuit layout design, the system comprising:

• a display device;
• a user input device;
• a storage device;
• and
• a processor electronically and communicatively coupled to the display device, the user input device, and the storage device and configured to perform the following procedures:
• provide an initial integrated circuit layout design;
• correct the initial layout design for etch-induced lithography errors to generate an etch-corrected layout design;
• fragment the etch-corrected layout design to generate a fragmented layout design comprising a plurality of fragments;
• perform both a bridging condition simulation and a pinching condition simulation on the fragmented layout design, wherein each of the bridging and pinching condition simulations comprises manipulating the fragmented layout design according to various process conditionals that have the potential to result in bridging errors and pinching errors, respectively;
• calculate a required movement for at least one fragment of the fragmented layout design based on the bridging condition simulation and the pinching condition simulation;
• modify the fragmented layout design by moving the at least one fragment in accordance with the required movement to generate a modified layout design;
• and
• perform optical proximity correction (OPC) on the modified layout design.

A non-transitory computer-readable medium comprising computer-readable instructions stored thereon, which, when executed by a computing system comprising a processor, cause the computing system to:

• provide an initial integrated circuit layout design;
• correct the initial layout design for etch-induced lithography errors to generate an etch-corrected layout design;
• fragment the etch-corrected layout design to generate a fragmented layout design comprising a plurality of fragments;
• perform both a bridging condition simulation and a pinching condition simulation on the fragmented layout design, wherein each of the bridging and pinching condition simulations comprises manipulating the fragmented layout design according to various process conditionals that have the potential to result in bridging errors and pinching errors, respectively;
• calculate a required movement for at least one fragment of the fragmented layout design based on the bridging condition simulation and the pinching condition simulation;
• modify the fragmented layout design by moving the at least one fragment in accordance with the required movement to generate a modified layout design;
• and
• perform optical proximity correction (OPC) on the modified layout design.