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US 2015/0030885 A1Published application
Coated article and chemical vapor deposition process
AssigneeSilcotek Corp.
InventorDavid A. SMITH
Life of this patent
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Abstract
A chemical vapor deposition process and article formed by a chemical vapor deposition process are disclosed. The process includes pretreating a substrate by exposing the substrate to an oxidative environment for a period of time, decomposing a material to form a layer on the substrate, and functionalizing one or both of the layer and the substrate. The pretreating pre-oxidizes the substrate.
Claims20
A chemical vapor deposition process, comprising:
- pretreating a substrate by exposing the substrate to an oxidative environment for a period of time;
- decomposing a material to form a layer on the substrate;
- and
- functionalizing one or both of the layer and the substrate;
- wherein the pretreating pre-oxidizes the substrate.
2 more elements
A process, comprising:
- pretreating an article by exposing the substrate to a thermal oxidative environment for a period of time, thereby forming a layer on the substrate by decomposition of a material;
- and
- decomposing the material for form a functionalized layer on the layer;
- wherein the pretreating pre-oxidizes the substrate;
- and
- wherein the functionalized layer is formed by functionalization of the layer formed by decomposition of the material.
3 more elements
An article, comprising:
- a substrate pretreated by exposing the substrate to a thermal oxidative environment for a period of time;
- a layer on the substrate formed by decomposition of a material;
- and
- a functionalized layer formed on the layer formed by decomposition of the material;
- wherein the pretreating pre-oxidizes the substrate;
- and
- wherein the functionalized layer is formed by functionalization of the layer formed by decomposition of the material.
4 more elements
Dependencies are inferred from the claim text.