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US 2015/0030846 A1Published application
Crystal film, method for manufacturing crystal film, vapor deposition apparatus and multi-chamber apparatus
AssigneeYoutec Co., Ltd.
InventorsTakeshi KIJIMA, Yuuji HONDA
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Abstract
To improve the single crystallinity of a stacked film in which a ZrO2 film and a Y2O3 film are stacked or a YSZ film. A crystal film includes a Zr film and a stacked film in which a ZrO2 film and a Y2O3 film formed on the Zr film are stacked, and has a peak half-value width when the stacked film is evaluated by X-ray diffraction being 0.05° to 2.0°.
Claims24
A crystal film comprising:
- a Zr film;
- and
- a stacked film in which a ZrO2 film and a Y2O3 film are stacked or a YSZ film, formed on said Zr film,
- wherein a peak half-value width when said stacked film or the YSZ film is evaluated by X-ray diffraction is 0.05° to 2.0°.
1 more element
A method for manufacturing a crystal film, comprising the steps of:
- forming a Zr film on a substrate heated to 700° C. or more by a vapor deposition method using a vapor deposition material having Zr;
- and
- forming a stacked film in which a ZrO2 film and a Y2O3 film are stacked or a YSZ film on said Zr film on a substrate heated to 700° C. or more, by a vapor deposition method using said vapor deposition material having Zr, a vapor deposition material having Y, and oxygen.
A vapor deposition apparatus comprising:
- a first chamber;
- a substrate holder holding a substrate, disposed in said first chamber;
- a vapor deposition material having Zr and a vapor deposition material having Y;
- a first heating mechanism heating said vapor deposition material;
- a gas-supplying mechanism supplying oxygen gas into said first chamber;
- and
- an evacuating mechanism evacuating an inside of said first chamber.
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Dependencies are inferred from the claim text.