Method for manufacturing transparent conductive pattern
AssigneesOsaka University, Showa Denko K.K.
InventorsKatsuaki Suganuma, Masaya Nogi, Jinting Jiu, Tohru Sugahara, Hiroshi Uchida, Kenji Shinozaki
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Abstract
A method for producing a transparent conductive pattern having an improved conductivity by pulse light irradiation. A transparent conductive pattern is produced by coating and drying a dispersion liquid having metal nanowires dispersed therein on a substrate, to deposit the metal nanowires, and irradiating pulsed light having a pulse width of 20 microseconds to 50 milliseconds to the metal nanowires deposited on the substrate, to thereby join intersections of the metal nanowires.
Claims11
1-5. (canceled)
A method for producing a transparent conductive pattern, wherein pulsed light having a pulse width of 20 microseconds to 50 milliseconds is irradiated to metal nanowires deposited on a substrate to join intersections of the metal nanowires.
Dependencies are inferred from the claim text.