US 2015/0029607 A1 · TRANSPARENT CONDUCTIVE LAYER AND CF SUBSTRATE HAVING SAME AND MANUFACTURING METHOD THEREOF

Abstract

The present invention provides a transparent conductive layer and a CF substrate having the transparent conductive layer and a manufacturing method thereof. The transparent conductive layer is made of a graphene transparent conductive material and is in the form of a thin film having a thickness of 0.36 nm-10 nm, transmittance of visible light being 80-97%, and surface resistance being 30-500Ω/□ and can replace a conventional ITO transparent conductive layer and has improved mechanical strength and flexibility. The CF substrate having the graphene transparent conductive layer uses the graphene transparent conductive layer to replace the ITO transparent conductive layer used in a CF substrate in order to obtain an electrode or a static electricity draining layer having high transmittance and excellent flexibility and, when used in a liquid crystal display panel, helps improve the transmittance of the liquid crystal panel and reduce the use of backlighting. The manufacturing method of the CF substrate having the graphene transparent conductive layer uses a CVD process to form graphene on a growth substrate to be subsequently transferred to a CF substrate body, of which the manufacture is easy and cost is low.

Claims10

Dependent claims

A transparent conductive layer, which is made of a graphene transparent conductive material and is in the form of a thin film having a thickness of 0.36 nm-10 nm, transmittance of visible light being 80-97%, and surface resistance being 30-500Ω/□.

A manufacturing method of a CF substrate, comprising the following steps:

(11) placing a growth substrate in a chemical vapor deposition reactor and introducing a mixed gas of a carbon source gas and a carrier gas to carry out a reaction under the conditions of 900-1120° C. and 40 Pa-5000 KPa for 1-60 min so as to grow a graphene film on the growth substrate, wherein the graphene film has a thickness of 0.36 nm-10 nm, transmittance of visible light being 80-97%, and surface resistance being 30-500Ω/□;
(12) coating a transfer medium layer on the graphene film to obtain a combination of transfer medium layer/graphene film/growth substrate;
(13) dipping the combination of transfer medium layer/graphene film/growth substrate in a growth substrate corrosive liquid to remove the growth substrate so as to obtain a combination of transfer medium layer/graphene film;
(14) providing a CF substrate body, wherein the CF substrate body comprises a glass substrate and a color resist layer formed on the glass substrate;
(15) positioning the combination of transfer medium layer/graphene film on the CF substrate body to proceed with transferring in room temperature so as to obtain a combination of transfer medium layer/graphene film/CF substrate body;
and
(16) placing and washing the combination of transfer medium layer/graphene film/CF substrate body in a transfer medium layer removing solvent to remove the transfer medium layer so as to obtain a graphene film on the CF substrate body and thus forming a transparent conductive layer on the CF substrate body.

4 more elements

Dependencies are inferred from the claim text.

Transparent conductive layer and cf substrate having same and manufacturing method thereof

Life of this patent

Transparent conductive layer and cf substrate having same and manufacturing method thereof

Life of this patent

Abstract

Claims10