Electrochromic devices having improved structure for reducing current leakage across lower transparent conductor layers
AssigneeSage Electrochromics, Inc.
InventorsMark Samuel Burdis, Jean-Christophe Giron
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AssigneeSage Electrochromics, Inc.
InventorsMark Samuel Burdis, Jean-Christophe Giron
Estimating the term…
One object of the present invention is to provide an electrochromic device having improved insulating film structure to reduce electrical leakage. The improved structure includes a lower conductive layer, upper transparent conductive layer, an electrochromic electrode layer, a counter electrode layer, and at least one ion-conductor layer sandwiched between the electrochromic electrode layer and the counter electrode layer. The lower transport conductive layer is scribed and the gap formed from the scribing is filled with the layer(s) formed above the lower conductive layer, such as the electrode layer formed directly above the lower conductive layer. The effective linewidth of the scribe is greater than the migration length of the lithium ions intercalated into the electrode layer, such that the electrode materials occupying the gap do not convert the electrode layer into an electrically conductive region.
An electrochromic device comprising:
A method for the preparation of an electrochromic device comprising:
The method of claim 19, wherein the first deposited electrode is deposited over the first and second portions of the first conductive layer, wherein said first and second portions are spaced more than about 25 microns apart.
Dependencies are inferred from the claim text.