Resist material and pattern forming method using same
AssigneeKabushiki Kaisha Toshiba
InventorsKei Kobayashi, Seiji Morita
Life of this patent
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Abstract
In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization. The material further includes a photo-acid generator as a polymerization initiator.
Claims20
A resist material to be used in an imprint process, comprising:
- a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group;
- a dendrimer having at least two reactive groups for photo-cationic polymerization;
- and
- a photo-acid generator as a polymerization initiator.
A resist material to be used in an imprint process, comprising:
- a diluent monomer having a vinyl ether group and a hydroxyl group;
- a dendrimer having at least two reactive groups for photo-radical polymerization;
- and
- an acid-and-radical generator as a polymerization initiator.
A pattern forming method comprising:
- providing, on a substrate, a resist material which comprises a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group, a dendrimer having at least two reactive groups for photo-cationic polymerization, and a photo-acid generator as a polymerization initiator;
- imprinting a template having concave-convex shape patterns against the resist material;
- curing the resist material;
- and
- releasing the template from the cured resist material.
A pattern forming method comprising:
- providing, on a substrate, a resist material which comprises a diluent monomer having a vinyl ether group and a hydroxyl group, a dendrimer having at least two reactive groups for photo-radical polymerization, and an acid-and-radical generator as a polymerization initiator;
- imprinting a template having concave-convex shape patterns against the resist material;
- curing the resist material;
- and
- releasing the template from the cured resist material.
Dependencies are inferred from the claim text.