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US 2015/0028442 A1Published application
Solid-state imaging device and manufacturing method of the same, and electronic apparatus
AssigneeSony Corporation
InventorYuki Miyanami
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AssigneeSony Corporation
InventorYuki Miyanami
Estimating the term…
The present disclosure relates to a solid-state imaging device and a manufacturing method of the same, and an electronic apparatus, capable of more reliably suppressing occurrence of color mixing. A trench is formed between PDs so as to be opened to a light receiving surface side of a semiconductor substrate on which a plurality of the PDs, each of which receives light to generate charges, are formed, an insulating film is embedded in the trench and the insulating film is laminated on a back surface side of the semiconductor substrate. Then, a light shielding portion is formed so as to be laminated on the insulating film and to have a convex shape protruding to the semiconductor substrate at a location corresponding to the trench. The present technology can be applied to a back surface irradiation type CMOS solid-state imaging device.
A solid-state imaging device comprising:
A manufacturing method of a solid-state imaging device comprising the steps of:
An electronic apparatus comprising:
Dependencies are inferred from the claim text.