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AssigneesBoe Technology Group Co., Ltd., Ordos Yuansheng Optoelectronics Co., Ltd.
InventorsJian Sun, Cheng Li, Seongjun An, Bongyeol Ryu
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An array substrate includes a substrate and data lines and scan lines arranged on the substrate, The data lines and the scan lines define plural pixel regions. A thin film transistor is arranged in each pixel region and includes a gate electrode, a source electrode, a drain electrode, and an active region. The gate electrode is arranged above the active region. The source electrode and the drain electrode are arranged at two opposite sides of the active region respectively. A light shielding metal layer is further arranged in each pixel region. The light shielding metal layer and the data lines are arranged in the same layer on the substrate. The light shielding metal layer is arranged under the active region and at least partially overlaps with the active region. The data line is close to the source electrode and does not overlap with the active region at least partially.
An array substrate including a substrate and data lines and scan lines arranged on the substrate, the data lines and the scan lines define a plurality of pixel regions, a thin film transistor is arranged in each of the plurality of pixel regions, the thin film transistor includes a gate electrode, a source electrode, a drain electrode, and an active region, the gate electrode is arranged above the active region, the source electrode and the drain electrode are arranged at two opposite sides of the active region respectively, a light shielding metal layer is further arranged In each of the plurality of pixel regions, wherein the light shielding metal layer and the data lines are arranged in the same layer on the substrate, the light shielding metal layer is arranged under the active region and at least partially overlaps with the active region in a projection direction, the data line is close to the source electrode and does not overlap with the active region at least partially in the projection direction.
A display device, wherein the display device includes an array substrate including a substrate and data lines and scan lines arranged on the substrate, the data lines and the scan lines define a plurality of pixel regions, a thin film transistor is arranged in each of the plurality of pixel regions, the thin film transistor includes a gate electrode, a source electrode, a drain electrode, and an active region, the gate electrode is arranged above the active region, the source electrode and the drain electrode are arranged at two opposite sides of the active region respectively, a light shielding metal layer is further arranged in each of the plurality of pixel regions, wherein the light shielding metal layer and the data lines are arranged in the same layer on the substrate, the light shielding metal layer is arranged under the active region and at least partially overlaps with the active region in a projection direction, the data line is close to the source electrode and does not overlap with the active region at least partially in the projection direction.
A method for manufacturing an array substrate including a step of forming data lines, scan lines, and a light shielding metal layer on a substrate arid a step of forming thin film transistors on the substrate, forming the thin film transistor includes a step of forming a gate electrode, a source electrode, a drain electrode, and an active region, both the thin film transistors and the light shielding metal layer are formed in a plurality of pixel regions defined by the scan lines and the data lines, wherein the light shielding metal layer and the data lines are formed in the same layer on the substrate in a single step, the light shielding metal layer is formed under the active region and at least partially overlaps with the active region in a projection direction, the data line is close to the source electrode and does not overlap with the active region at least partially in the projection direction.
Dependencies are inferred from the claim text.