Transparent electrode, electronic device, and transparent electrode manufacturing method

The transparent electrode, comprising:

• a nitrogen-containing layer constituted using a compound containing nitrogen atoms;
• and
• an electrode layer that is provided adjacent to the nitrogen-containing layer within two minutes after the formation of the nitrogen-containing layer, that has a 12 nm or lower film thickness and has a measurable sheet resistance, and that is constituted using silver or an alloy having silver as the main component.

A method for manufacturing a transparent electrode, comprising steps of:

• forming a nitrogen-containing layer constituted using a compound containing nitrogen atoms at a deposition speed of 0.3 nm/s or greater;
• and
• forming an electrode layer, on the nitrogen-containing layer, that has a 12 nm or lower film thickness and has a measurable sheet resistance, and that is constituted using silver or an alloy having silver as the main component.

A method for manufacturing a transparent electrode, comprising steps of:

• forming a nitrogen-containing layer constituted using a compound containing nitrogen atoms;
• and
• forming an electrode layer that has a 12 nm or lower film thickness and has a measurable sheet resistance and that is constituted using silver or an alloy having silver as the main component, in a state of being adjacent to the nitrogen-containing, within two minutes after forming the nitrogen-containing layer.