Inspection apparatus and inspection method
AssigneeKabushiki Kaisha Toshiba
InventorKazuhiro NOJIMA
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AssigneeKabushiki Kaisha Toshiba
InventorKazuhiro NOJIMA
Estimating the term…
In accordance with an embodiment, an inspection apparatus includes first and second charged particle beam application units to apply charged particle beams to a sample, a detector, an image acquiring unit, and a judgment unit. The sample includes a stack structure in which electrically conductive films and insulating films are alternately stacked, electrically conductive layers, first and second contact plugs. The first charged particle beam application unit controls the potential of each electrically conductive film by applying a first charged particle beam to the second contact plugs. The second charged particle beam application unit applies a second charged particle beam to the first contact plugs. The detector detects secondary charged particles from the stack structure and outputs a signal. The image acquiring unit processes the signal to acquire a first image of the sample surface. The judgment unit judges an abnormality of the sample from the acquired first image.
An inspection apparatus comprising:
A method of inspecting a sample, the sample comprising a stack structure, electrically conductive layers, first and second contact plugs, the electrically conductive films and insulating films being alternately stacked in the stack structure, electrically conductive layers being provided in hole patterns formed in the stack structure in a stacking direction and being respectively connected to the electrically conductive films via a capacitance or a resistance, the first contact plugs being respectively connected to the electrically conductive layers, and the second contact plugs being connected to the electrically conductive layers, the method comprising:
Dependencies are inferred from the claim text.