Inspection of a lithographic mask that is protected by a pellicle

A system for evaluating lithography mask, the system comprises:

• electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask;
• wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask;
• at least one detector for detecting detected emitted electrons and for generating detection signals;
• wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask;
• and
• a processor for processing the detection signals to provide information about the lithography mask.

A non-transitory computer readable medium that stores instructions for:

• receiving detection signals;
• wherein the detection signals are generated by at least one detector that detects detected emitted electrons;
• wherein the detected emitted electrons are generated as a result of directing by electron optics, primary electrons towards a pellicle that is positioned between the electron optics and a lithography mask;
• wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask;
• and
• processing the detection signals to provide information about the lithography mask.