Facing target sputtering apparatus
OwnerHun Kim, Jin-Woo Park +2inventors
InventorsHun Kim, Jin-Woo Park, Ou-Hyen Kim, Sun-Jin Lee
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Abstract
A sputtering apparatus includes a plurality of targets arranged to face each other and a magnetic unit producing magnetic field. A space between the targets is disposed on a substrate on which a deposition is being made during a sputtering process. The magnetic unit includes at least two magnet members. The space between the targets is surrounded by a space between the at least two magnet members. Each of the magnet members includes at least one first magnet and at least one second magnet separated from each other with an interval.
Claims18
A sputtering apparatus comprising:
- a plurality of targets arranged to face each other;
- and
- a magnetic member producing a magnetic field that is to be formed in a space between the plurality of targets, the magnetic member comprising a bar magnet and a cylindrical magnet.
A sputtering apparatus comprising:
- a plurality of targets arranged to face each other, a space between the targets disposed on a substrate on which a deposition is being made during a sputtering process;
- and
- a magnetic unit producing magnetic field, the magnetic unit comprising at least two magnet members, the space between the targets being surrounded by a space between the at least two magnet members, each of the magnet members including at least one first magnet and at least one second magnet separated from each other with an interval.
Dependencies are inferred from the claim text.