Vapor deposition apparatus
AssigneeSamsung Display Co., Ltd.
InventorsJin-Kwang Kim, Seung-Yong Song, Myung-Soo Huh, Suk-Won Jung, Choel-Min Jang, Jae-Hyun Kim, Sung-Chul Kim
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Abstract
A vapor deposition apparatus includes a first injection unit through which a first raw gas is injected in a first direction, and a first filter unit which is mounted in the first injection unit and includes a plurality of plates separated from one another in the first direction and disposed in parallel to one another, where holes are defined in each of the plurality of plates which is detachably coupled in the first filter unit.
Claims20
A vapor deposition apparatus comprising:
- a first injection unit through which a first raw gas is injected in a first direction;
- and
- a first filter unit which is mounted in the first injection unit and comprises:
- a plurality of plates separated from one another in the first direction and disposed in parallel to one another,
- wherein holes are defined in each of the plurality of plates which is detachably coupled in the first filter unit.
A vapor deposition apparatus for providing a deposition film on a substrate, the vapor deposition apparatus comprising:
- a first injection unit through which a first raw gas is injected in a first direction toward the substrate;
- a purge unit through which a purge gas is injected in the first direction;
- and
- an exhaust unit through which an exhaust gas is discharged in a second direction opposite the first direction,
- wherein first filter units are respectively mounted in the first injection unit and the exhaust unit, and the first injection unit and the exhaust unit have a same configuration.
Dependencies are inferred from the claim text.