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US 2015/0021292 A1Published application
Polishing agent for synthetic quartz glass substrate
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsDaijitsu HARADA, Masaki TAKEUCHI, Yukio SHIBANO, Shuhei UEDA, Atsushi WATABE
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Abstract
Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.
Claims14
A method of polishing a synthetic quartz glass substrate by a polishing slurry comprising:
- a colloidal solution in the form of a colloidal silica water dispersion;
- and
- at least one component selected from the group consisting of a carboxylic acid polymer, a phenol, and a glycosaminoglycan, said colloidal solution having a colloidal silica concentration of 20 to 50% by mass, and said polishing slurry having pH 9 to 10.5.
Dependencies are inferred from the claim text.