Sputtering device
AssigneeNitto Denko Corporation
InventorsTomotake Nashiki, Akira Hamada
Life of this patent
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Abstract
In a sputtering device of the present invention, a long film is guided by a plurality of concave guide rolls. Pressure imposed on the long film from the plurality of concave guide rolls is strong as near as an end and is weak as near as the center. Accordingly, the long film is substantially supported in an end portion of each of the concave guide rolls. Since wrinkles generated on the long film are not subjected to strong pressure from the concave guide rolls when passing through the concave guide rolls, these wrinkles do not turn to folds and pass through as they are.
Claims4
A sputtering device configured to form a thin layer on a long film, the sputtering device comprising:
- a vacuum chamber;
- a vacuum pump for evacuating the vacuum chamber;
- a film depositing roll provided in the vacuum chamber;
- a target facing the film depositing roll;
- a gas pipe for supplying a gas into the vacuum chamber;
- a supply roll for supplying the long film;
- a storage roll for storing the long film;
- and
- a plurality of concave guide rolls for guiding conveyance of the long film, the plurality of concave guide rolls each having a great diameter in an end portion and a small diameter in the center.
Dependencies are inferred from the claim text.