Methods and systems for plasma deposition and treatment
OwnerPeter F. Vandermeuleninventor
Life of this patent
Estimating the term…
Abstract
This application is directed to an apparatus for creating microwave radiation patterns for an object detection system. The apparatus includes a waveguide conduit having first slots at one side of the conduit and corresponding second slots at an opposite side of the conduit. The waveguide conduit is coupled to a microwave source for transmitting microwaves from the microwave source through the plurality of first slots. A plunger is moveably positioned in the waveguide conduit from one end thereof. The plunger allows the waveguide conduit to be tuned to generally optimize the power of the microwaves exiting the first slots. Secondary plungers are each fitted in one of the second slots to independently tune or detune microwave emittance through a corresponding first slot.
Claims33
A plasma deposition apparatus, comprising:
- a waveguide conduit having a plurality of slots therein, said waveguide conduit being coupled to a microwave source for transmitting microwaves from the microwave source through the plurality of slots, said waveguide conduit further comprising secondary slots opposite said plurality of slots;
- a set of secondary plungers fitted in said secondary slots to amplify radiation emitted through said plurality of slots;
- and
- one or more pipes having an outlet end positioned at each of the plurality of slots for transporting material from one or more material sources to the plurality of slots.
Dependencies are inferred from the claim text.