Apparatus and method for creating configuration requirements

A configuration requirement creation apparatus comprising:

• a memory configured to store information indicating a plurality of management units that manage a plurality of apparatuses and have an inclusion relationship and indicating sets of apparatuses divided by the respective management units, and to store setting values of a plurality of attributes associated with each of the apparatuses;
• and
• a processor configured to perform a process including:
• specifying a management unit having a first feature with regard to setting values of any one of the attributes in each of sets of apparatuses divided by the management unit, with reference to the memory,
• detecting, for the setting values of the attribute having the first feature, a second feature established among a plurality of sets of apparatuses that are divided by the specified management unit, and
• creating information indicating requirements for the setting values of the attribute in the specified management unit, based on the first and second features.

A configuration requirement creation method comprising:

• specifying, by a processor, with reference to information indicating a plurality of management units that manage a plurality of apparatuses and have an inclusion relationship and indicating sets of apparatuses divided by the respective management units, and with reference to setting values of a plurality of attributes stored in association with each of the apparatuses, a management unit having a first feature with regard to setting values of any one of the attributes in each of sets of apparatuses divided by the management unit;
• detecting, by the processor, for the setting values of the attribute having the first feature, a second feature established among a plurality of sets of apparatuses that are divided by the specified management unit;
• and
• creating, by the processor, information indicating requirements for the setting values of the attribute in the specified management unit, based on the first and second features.