Method and system for measuring capacitance difference between capacitive elements
AssigneesImec, Sony Corporation
InventorsGeert Van der Plas, Ken Sawada, Yuichi Miyamori, Ankur Anchlia, Abdelkarim Mercha
Life of this patent
Estimating the term…
Loading patent…
AssigneesImec, Sony Corporation
InventorsGeert Van der Plas, Ken Sawada, Yuichi Miyamori, Ankur Anchlia, Abdelkarim Mercha
Estimating the term…
Methods and systems for measuring capacitance difference are disclosed. In one aspect, first and second capacitive elements are connected between voltage receiving nodes for receiving first and second DC voltages and nodes connectable to a third DC voltage via a first, resp. second switch. Further, in a first phase, a voltage difference is applied to charge the capacitive elements and the switches are alternately closed. First resulting currents are measured. Further, in a second phase, the first and second DC voltages are applied alternatingly and the switches are alternately closed. Second resulting currents are measured. The capacitance difference can be determined from the first and second resulting currents.
A method for measuring a capacitance difference (ΔC) between a first capacitive element (DUT1) and a second element (DUT2), the method comprising the steps of:
A system for measuring a capacitance difference (ΔC) between a first capacitive element (DUT1) and a second capacitive element (DUT2), the system comprising the following components:
Dependencies are inferred from the claim text.