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US 2014/0370305 A1Published application
Patternable materials and methods of use
OwnerMaria Celeste Tria, Christine Joanne Landry-Coltraininventors
Life of this patent
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Abstract
A patternable material can be prepared with an elastomeric relief image-forming layer. The patternable material has a relief image-forming elastomeric layer and also has a layer disposed on the entire surface of this elastomeric layer. This layer includes a reaction product of a non-fluorinated metal oxide precursor and a hydrolyzable fluoroalkylsilane. The reaction product is formed by applying a reactive composition of the noted components over the entire surface.
Claims15
A patternable material comprising:
- a relief image-forming elastomeric layer, and
- a layer disposed on the relief image-forming elastomeric layer, the layer comprising a reaction product of a non-fluorinated metal oxide precursor and a hydrolyzable fluoroalkylsilane.
A method for providing a patterned material useful for printing, the method comprising:
- providing a patternable material precursor comprising a relief image-forming elastomeric layer,
- applying a reactive composition comprising a non-fluorinated metal oxide precursor and a hydrolyzable fluoroalkylsilane over the entire surface on the relief image-forming elastomeric layer,
- drying and curing the reactive composition to form a layer comprising a reaction product of a non-fluorinated metal oxide precursor and a hydrolyzable fluoroalkylsilane, and
- providing a relief image comprising uppermost surfaces and relief recesses comprising recess walls and recess floors, and simultaneously removing the reaction product from the relief recesses while leaving the reaction product disposed only on the uppermost surfaces,
- to form a patterned material useful for printing.
2 more elements
Dependencies are inferred from the claim text.