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US 2014/0370196 A1Published application
Mask for depositing a thin film and a thin film deposition method using the same
AssigneeSamsung Display Co., Ltd.
InventorWoong-Sik Kim
Life of this patent
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Abstract
A mask for depositing a thin film and a thin film deposition method using the same are disclosed. The mask includes pattern bars disposed on a frame. The pattern bars are moveable and are position to form a deposition pattern. The mask includes a pattern modification mechanism configured to move the pattern pars to a plurality of positions to modify the deposition pattern.
Claims20
A deposition mask, comprising
- a frame;
- pattern bars disposed on the frame, the pattern bars configured to form a deposition pattern;
- and
- a pattern modification mechanism configured to move the pattern bars to modify the deposition pattern.
1 more element
A method of depositing a thin film, the method comprising:
- preparing a mask in which pattern bars are disposed on a frame, the pattern bars configured to form a deposition pattern;
- moving the pattern bars to modify the deposition pattern;
- and
- performing a deposition process using the modified deposition pattern.
1 more element
A deposition mask, comprising:
- a frame including pattern bars configured to be adjusted for a plurality of deposition patterns;
- and
- a pattern modification mechanism configured to adjust the position of the pattern bars to form the plurality of deposition patterns.
Dependencies are inferred from the claim text.