Method for establishing distortion properties of an optical system in a microlithographic measurement system
AssigneeCarl Zeiss SMS GmbH
InventorMario Laengle
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Abstract
A method for establishing distortion properties of an optical system in a microlithographic measurement system is provided. The optical system has at least one pupil plane, in which the distortion properties of the optical system are established on the basis of measuring at least one distortion pattern, which the optical system generates when imaging a predetermined structure in an image field. The distortion properties of the optical system are established on the basis of a plurality of measurements of distortion patterns, in which these measurements differ from one another in respect of the intensity distribution present in each case in the pupil plane.
Claims20
A method for establishing distortion properties of an optical system in a microlithographic measurement system, wherein the optical system has at least one pupil plane and wherein the distortion properties of the optical system are established on the basis of measuring at least one distortion pattern, which the optical system generates when imaging a predetermined structure in an image field,
- wherein the distortion properties of the optical system are established on the basis of a plurality of measurements of distortion patterns, wherein these measurements differ from one another in respect of the intensity distribution present in each case in the pupil plane.
Dependencies are inferred from the claim text.