Mirror for a fabry-perot interferometer, and a method for producing the same
AssigneeTeknologian tutkimuskeskus VTT Oy
InventorsAnna RISSANEN, Jarkko ANTILA
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Abstract
A method for producing a mirror plate for a Fabry-Perot interferometer includes providing a base slab, which includes a substrate coated with a reflective multilayer coating, forming one or more intermediate layers on the base slab such that the lowermost intermediate layer substantially consists of silica, and such that the multilayer coating is at least partially covered by the lowermost intermediate layer, forming one or more capacitive sensor electrodes by depositing conductive material on top of the intermediate layers, and removing material of the lowermost intermediate layer by etching in order to form an exposed aperture portion of the multilayer coating.
Claims12
A method for producing a mirror plate for a Fabry-Perot interferometer, the method comprising:
- providing a base slab, which comprises a substrate coated with a semi-transparent reflective multilayer coating,
- forming one or more intermediate layers on the base slab such that the lowermost intermediate layer substantially consists of silica, and such that the multilayer coating is at least partially covered by the lowermost intermediate layer,
- forming one or more capacitive sensor electrodes by depositing conductive material on top of the intermediate layers, and
- removing material of the lowermost intermediate layer by etching in order to form an exposed aperture portion of the multilayer coating.
A mirror plate for a Fabry-Perot interferometer, the mirror plate comprising:
- a base slab, which has a substrate coated with a semi-transparent reflective multilayer coating,
- one or more intermediate layers implemented on the base slab such that the lowermost intermediate layer substantially consists of silica,
- one or more capacitive sensor electrodes implemented on top of the intermediate layers, and
- an exposed aperture portion of the multilayer coating for reflecting and transmitting light,
- wherein the elevation of the capacitive electrodes with respect to the exposed aperture portion is in the range of 1 μm to 1000 μm.
A Fabry-Perot interferometer comprising:
- a first mirror plate, which comprises:
- a base slab, which has a substrate coated with a semi-transparent reflective multilayer coating,
- one or more intermediate layers implemented on the base slab such that the lowermost intermediate layer substantially consists of silica,
- one or more capacitive sensor electrodes implemented on top of the intermediate layers, and
- an exposed aperture portion of the multilayer coating for reflecting and transmitting light;
- and
- a second mirror plate, which comprises a counter electrode;
- wherein the interferometer has an adjustable mirror spacing, the electrodes of the mirror plates form a capacitor, whose capacitance depends on the mirror spacing, and the elevation of the capacitive electrodes of the first mirror plate with respect to the exposed aperture portion is in the range of 1 μm to 1000 μm.
A spectrometer comprising a Fabry-Perot interferometer and an image sensor arranged to detect light transmitted through the interferometer, wherein the interferometer comprises:
- a first mirror plate, which in turn comprises:
- a base slab, which has a substrate coated with a semi-transparent reflective multilayer coating,
- one or more intermediate layers implemented on the base slab such that the lowermost intermediate layer substantially consists of silica,
- one or more capacitive sensor electrodes implemented on top of the intermediate layers, and
- an exposed aperture portion of the multilayer coating for reflecting and transmitting light;
- a second mirror plate, which comprises a counter electrode, wherein the interferometer has an adjustable mirror spacing, and the electrodes of the mirror plates form a capacitor, whose capacitance depends on the mirror spacing;
- and
- a capacitance monitoring unit arranged to provide a sensor signal indicative of said capacitance;
- wherein the elevation of the capacitive electrodes of the first mirror plate with respect to the exposed aperture portion is in the range of 1 μm to 1000 μm.
Dependencies are inferred from the claim text.