Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
AssigneeASML Netherlands B.V.
InventorsRaymond Wilhelmus Louis Lafarre, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade, Elisabeth Corinne Rodenburg
Life of this patent
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Abstract
A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
Claims22
A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
- a main body having a smooth and flat surface;
- a thin-film stack provided on the surface and forming an electric component;
- and
- a plurality of burls provided on the thin-film stack and having end surfaces to support a substrate,
- wherein the main body is formed of a different material than the burls.
(canceled)
A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
- a main body having a smooth and flat surface;
- a thin-film stack provided on the smooth and flat surface and forming an electronic or electric component, the thin-film stack having a plurality of apertures formed therein;
- and
- a plurality of projections, each projection provided in an aperture of the thin-film stack, the plurality of projections being configured to support a substrate.
(canceled)
A method of manufacturing a substrate holder for use in a lithographic apparatus, the method comprising:
- providing a main body having a smooth and flat surface;
- forming a thin-film stack on the smooth and flat surface of the main body;
- and
- forming a plurality of burls on the thin-film stack, the burls projecting from the stack and having end surfaces to support a substrate.
A method of manufacturing a substrate holder for use in a lithographic apparatus, the method comprising:
- providing a main body having a smooth and flat surface;
- forming a thin-film stack on the smooth and flat surface of the main body;
- forming a plurality of apertures in the thin-film stack;
- and
- forming a plurality of burls in the apertures of the thin-film stack, the burls projecting from the stack and having end surfaces to support a substrate.
Dependencies are inferred from the claim text.