US 2014/0368300 A1 · Waveguide Filter, Preparation Method Thereof and Communication Device

Abstract

A waveguide filter, a preparation method thereof, and a communication device to resolve a problem in which a prepared high-resonance-frequency waveguide filter cannot meet an application requirement due to a low precision of an existing machining process. The waveguide filter includes a substrate made of a silicon material, where an etching cavity having a flat side wall is formed in the substrate, a depth of the etching cavity is not greater than 0.7 mm, and an angle between the side wall of the etching cavity and a vertical direction is not smaller than 1 degree, and a waveguide port is disposed on the substrate, where the waveguide port is connected to the etching cavity and electrically connected to the etching cavity.

Claims19

Dependent claims

A waveguide filter comprising a substrate made of a silicon material and comprising:

an etching cavity having a flat side wall formed in the substrate, wherein a depth of the etching cavity is not greater than 0.7 millimeter (mm), and wherein an angle between the side wall of the etching cavity and a vertical direction is not smaller than 1 degree;
and
a waveguide port disposed on the substrate, wherein the waveguide port is connected to the etching cavity and electrically connected to the etching cavity.

A method for preparing a waveguide filter, comprising:

providing a substrate made of a silicon material;
forming, by using a micro-electro-mechanical systems (MEMS) machining process, an etching cavity in the substrate;
and
forming, on the substrate, a waveguide port that is connected to the etching cavity and electrically connected to the etching cavity.

1 more element

A communication device, comprising a printed circuit board, wherein a waveguide filter is mounted on the printed circuit board, wherein the waveguide filter comprises a substrate made of a silicon material, and wherein the substrate comprises:

an etching cavity having a flat side wall formed in the substrate, wherein a depth of the etching cavity is not greater than 0.7 millimeter (mm), and wherein an angle between the side wall of the etching cavity and a vertical direction is not smaller than 1 degree;
and
a waveguide port disposed on the substrate, wherein the waveguide port is connected to the etching cavity and electrically connected to the etching cavity.

Dependencies are inferred from the claim text.

Waveguide Filter, Preparation Method Thereof and Communication Device

Life of this patent

Waveguide Filter, Preparation Method Thereof and Communication Device

Life of this patent

Abstract

Claims19